x-ray diffraction

Influence of Argon Pressure on Texture and Microstructure of Cobalt Films Produced by Dc-Sputtering

Background and Objectives: The development of methods of textured Co film formation is of practical interest in the field of creating media with perpendicular recording of information or lateral spin-valve structures. Despite a rather wide study of the growth conditions effects on the microcrystalline structure of sputtered cobalt films, the possibility of changing the texture and microstructure via a change of the gas pressure has not been discussed.