microwave plasma

Background and Objectives: Development of techniques and investigation of secondary emission properties of film diamond graphite nanocomposites obtained in different modes of microwave plasma-chemical deposition were performed for sources of electromagnetic radiation of different output power of microwave and subteragetic frequency ranges. Materials and Methods: Production of film nano diamond graphite composites was carried out in a vacuum plant using a microwave ion-plasma source.

Background and Objectives: Requirements and problems are formulated when creating cathode materials for high-current emission electronics. It has been shown that to create autocathodes with a current density of up to 100 A/cm2 and above, the development of new nanostructured carbon materials with a surface density of nanodiamond edges of not less than 106–108 cm-2 is necessary.

Background and Objectives: The laws governing the modification of the current-voltage characteristics of the metal-insulatorsemiconductor structures due to the formation of embedded surface potentials are investigated. Surface potentials are formed when an atomically clean surface of silicon crystals is produced using microwave plasma micromachining. The aim of the work is to study the effect of plasma micromachining in various chemically active gaseous media on the properties of silicon MIS structures.