Izvestiya of Saratov University.
ISSN 1817-3020 (Print)
ISSN 2542-193X (Online)


cathode sputtering

Vacuum-plasma processes at extreme field emission in diamond electron sources

Background and Objectives: The use of high-current field electron sources that satisfy various circuitry requirements as a part of electronic devices for various purposes suggests the possibility of matching their operation modes with the operating characteristics of the devices, as well as high reproducibility of emission parameters, stability and the necessary resource of reliability and durability.